Journal of Oral Tissue Engineering

ORIGINAL ARTICLE
 Deposition of Thin Calcium Phosphate Film onto Titanium Using RF Magnetron Sputtering Technique

Tohru HAYAKAWA1, Masao YOSHINARI2, Kenichi TAKAHASHI3 and Kimiya NEMOTO1

1Department of Dental Materials, Research Institute of Oral Science,
Nihon University School of Dentistry at Matsudo,
2-870-1, Sakaecho-nishi, Matsudo, Chiba 271-8587, Japan
2Department of Dental Materials, Science and Oral Health Science Center,
Tokyo Dental College, 1-2-2 Masago, Mihamaku, Chiba 261-8502, Japan
3Department of Dental Materials, Nihon University Graduate School of Dentistry
at Matsudo, 2-870-1, Sakaecho-nishi, Matsudo, Chiba 271-8587, Japan
Original Paper:J Oral Tissue Engin 2004;1(1):41-49
Full Text. DOI https://doi.org/10.11223/jarde.1.41
In the present study, we aimed to deposit thin calcium phosphate film onto titanium substrate using magnetron sputtering method. The hydroxyapatite target and trical-cium phosphate target were prepared by cold isostatic pressing method. When hy-droxyapatite target was used, the crack was formed on the target material during the sputtering.
The film thickness was increased according to the increase of the coating time. Heating the titanium substrate around 250oC produced tighter bonding between coated film and titanium, and also increased film thickness compared with no-heating of the titanium. After a 5-hr coating process, the thickness of the deposited film was approximately 0.10 µm when titanium substrate was heated. EPMA and FT-IR-RAS measurement reveled that the main component of coated film was calcium phos-phate material.
In conclusions, thin calcium phosphate film was deposited onto titanium using magnetron sputtering method.
Key words: Calcium phosphate costing, titanium, magnetron sputtering